295 / 2017-12-07 21:44:50
GaN-based enhancement-mode FinFET with double-channel AlGaN/GaN heterostructure
enhancement-mode,FinFET,double-channel
Final Paper
Chong Wang / Xidian University
Xin Wang / Xidian University
GaN-based enhancement-mode FinFET with double-channel AlGaN/GaN heterostructure is proposed. The DC characteristics of device is simulated by sentaurus TCAD software. The simulation results show that the double-channel AlGaN/GaN with doped barriers can improve the channel current. Furthermore, The combination of FinFET and double-channel structure can improve the saturation current and the control ability of the gate, the enhancement-mode device can be obtained with the 30nm Fin-width, and the peak transconductance reaches 417mS/mm.
Important Date
  • Conference Date

    May 17

    2018

    to

    May 19

    2018

  • Dec 08 2017

    Abstract Submission Deadline

  • Jan 30 2018

    Abstract Notification of Acceptance

  • Feb 10 2018

    Draft paper submission deadline

  • Feb 10 2018

    Final Paper Deadline

  • May 19 2018

    Registration deadline

Sponsored By
IEEE
Organized By
Xi'an Jiaotong University
Xidian University
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