478 / 2019-02-27 23:50:37
Low-Loss SOI-LIGBT With Assistant-Depletion Trench and Partial P-type Buried Layer
SOI-LIGBT,assistant-depletion trench,partial P-type buried layer,turn-off speed,turn-off loss
Final Paper
Yanqin Zou / Southeast University
Shaohong Li / Southeast University
Long Zhang / Southeast University
Jing Zhu / Southeast University
Guichuang Zhu / Southeast University
Weifeng Sun / Southeast University
In this paper, a high-voltage silicon-on-insulator lateral insulated gate bipolar transistor (SOI-LIGBT) for high turn-off speed and low turn-off loss (EOFF) is proposed. The device features an Assistant-Depletion Trench (ADT) shorted with the P+ emitter and a partial P-type Buried Layer (PBL) at the bottom of the drift region. The ADT together with the PBL accelerates the depletion of the drift region, which benefits to fast extraction of stored carrier during turn-off period. The simulations demonstrate that the proposed SOI-LIGBT exhibits a superior tradeoff between turn-off loss (EOFF) and on-state voltage drop (VON) to the conventional SOI-LIGBT. EOFF of the proposed SOI-LIGBT is 69% lower than that of the conventional SOI-LIGBT at the same VON of 1.53 V.
Important Date
  • Conference Date

    Jun 12

    2019

    to

    Jun 14

    2019

  • Jun 12 2019

    Draft paper submission deadline

  • Jun 14 2019

    Registration deadline

Organized By
Xi'an University of Technology
Contact Information