142 / 2021-04-17 16:41:03
Simulation Comparative Study on Ga2O3 and SiC Schottky Diodes
Ga2O3, SiC, Schottky barrier diode, JBS diode, Specific on-resistance
Draft Accepted
Zongqi Chen / University of Electronic Science and Technology of China
Zewei Hu / University of Electronic Science and Technology of China
Jiacheng Gao / University of Electronic Science and Technology of China
Moufu Kong / University of Electronic Science and Technology of China
Ke Huang / University of Electronic Science and Technology of China
Ronghe Yan / University of Electronic Science and Technology of China
Jiaxin Guo / University of Electronic Science and Technology of China
Bin Wang / University of Electronic Science and Technology of China
Bingke Zhang / University of Electronic Science and Technology of China
This paper presents a comparative study on high voltage β-Ga2O3 and 4H-SiC Schottky diodes based on device TCAD numerical simulations. Different Schottky diode structures are comparative investigated, and the results show that the Ga2O3 Schottky diodes achieve much lower specific on-resistance (Ron,sp), much higher figure of merit (FOM) and better reverse recovery characteristics in comparison with that of the SiC Schottky diodes at almost the same level of breakdown voltage (BV). And the leakage current in reverse bias state of different structures is also evaluated, and the trench structure achieves much lower leakage current. The results of this paper can be used as a guideline for the design of high-voltage Ga2O3 and SiC Schottky diodes.

 
Important Date
  • Conference Date

    Jul 10

    2021

    to

    Jul 12

    2021

  • May 10 2021

    Draft paper submission deadline

  • Jul 06 2021

    Registration deadline

Sponsored By
Changsha University of Science & Technology
Supported By
IEEE Electron Devices Society
IEEE
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