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Dynamics of armature-rail electrical contact under multi-physics field coupling
ID：124 View Protection：ATTENDEE Updated Time：2024-08-15 10:53:38 Hits：559 Poster Presentation

Start Time：Pending（Asia/Shanghai）

Duration：Pending

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Abstract
电磁轨道发射器工作在电磁-热-力多物理场耦合的极端冲击条件下。电枢和电源轨的接触状态与整个系统的输出性能和工作效率有关，脉冲电流和界面粗糙度对接触状态有显著影响。搭建了电磁轨道发射实验平台，并对枪口电压、轨道电流和接触电阻进行了实验测量。构建了多物理场耦合电枢-导轨电接触模型，分析了电枢和导轨的电流密度、温度和磁通密度的分布规律。此外，还研究了电流幅值和摩擦因子对其 动态特性以及温度和磁通密度的影响。
 
Keywords
Dynamic characteristics,Electromagnetic emission,Interface roughness,Multi-field coupling
Speaker
Luyao Liu
student Shandong University

Submission Author
Luyao Liu Shandong University
Pengfei Lu Shandong University
Jingtong Feng Shandong University
Ali Mohammed Ali Abdo Shandong University
Yisong Wang Shandong University
Hongshun Liu Shandong University
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Important Date

  • Conference Date

    Nov 06

    2024

    to

    Nov 08

    2024

  • Sep 15 2024

    Draft paper submission deadline

  • Nov 08 2024

    Registration deadline

Sponsored By
Huazhong University of Science and Technology
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