Research on Wafer Surface Defect Detection Based on YOLOv8 and TensorRT
ID:17 View Protection:ATTENDEE Updated Time:2025-11-10 10:42:22 Hits:276 Oral Presentation

Start Time:2025-11-22 16:00(Asia/Shanghai)

Duration:20min

Session:S2 Parallel Session 2 » S2-1Parallel Session 2-22 PM

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Abstract
As a cornerstone of the semiconductor industry, the surface quality of wafers directly impacts chip yield and performance. Minute defects, such as chipping, edge chipping, and positive chipping, can lead to circuit failure. Traditional optical inspection methods, which rely on human operators, suffer from low efficiency, subjectivity, and operator fatigue, making them inadequate for the high-precision and high-efficiency demands of modern semiconductor manufacturing. This paper introduces a real-time detection method based on the YOLOv8 object detection algorithm and the NVIDIA TensorRT inference accelerator. This method leverages YOLOv8's superior detection accuracy and speed, combined with TensorRT's model optimization and acceleration capabilities, achieving a mean average precision mAP of up to 98.2% and an inference speed of 217 FPS. Experimental results demonstrate that this system can efficiently and accurately locate and classify wafer defects on real-time production lines, providing a reliable embedded solution for improving quality control processes in semiconductor manufacturing.
Keywords
defect detection; wafer surface; YOLOv8; TensorRT;
Speaker
Lin Xu
student Jiangsu Normal University

Submission Author
Lin Xu Jiangsu Normal University
Pengcheng Ji Jiangsu Normal University
Guo Ye Jiangsu Normal University
Zhenzhi He Jiangsu Normal University
Xiangning Lu Jiangsu Normal University
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Important Date
  • Conference Date

    Nov 21

    2025

    to

    Nov 23

    2025

  • Oct 20 2025

    Draft paper submission deadline

  • Dec 08 2025

    Registration deadline

Sponsored By
IEEE Instrumentation and Measurement Society
South China University of Technology
Organized By
South China University of Technology