Unified Eikonal-Wulff framework for anisotropic wet etching profile prediction:theory and application to quartz MEMS
ID:84 View Protection:ATTENDEE Updated Time:2025-11-10 11:44:06 Hits:115 Oral Presentation

Start Time:Pending(Asia/Shanghai)

Duration:Pending

Session:No Session »

No files

Abstract
This paper proposes and systematizes a unified Eikonal–Wulff framework for predicting the anisotropic wet -etching morphology of two-dimensional crystals . Starting from the "shortest arrival time" principle, the static Hamilton–Jacobi/Eikonal equations are derived, and the existence and uniqueness of the solution are guaranteed by the viscosity theory. Furthermore, the duality of the Hamiltonian and the Wulff-shaped support function is shown to be equivalent to the Huygens–Minkowski construction. A reproducible engineering pipeline is provided: H is constructed from the directional velocity R(θ), and after convexification, the arrival time field is solved using a FSM and aligned with the literature baseline. This method combines geometric intuition with PDE scalability, making it suitable for early-stage quartz MEMS design and extensible to multi-physics coupling and three-dimensional applications.
Keywords
anisotropic wet etching,Eikonal,Wulff shape,fast sweep method,quartz MEMS
Speaker
Y.Q. XIE
学生 西安电子科技大学

Submission Author
Y.Q. XIE 西安电子科技大学
Submit Comment
Verify Code Change Another
All Comments
Important Date
  • Conference Date

    Nov 21

    2025

    to

    Nov 23

    2025

  • Oct 20 2025

    Draft paper submission deadline

  • Dec 08 2025

    Registration deadline

Sponsored By
IEEE Instrumentation and Measurement Society
South China University of Technology
Organized By
South China University of Technology