Presentation Details
Research on the discharge characteristics of repetition-frequency electrodeless Z-pinch
ID：210
View Protection：ATTENDEE
Updated Time：2026-04-29 14:24:43 Hits：61
Oral Presentation
Start Time：Pending（Asia/Shanghai）
Duration：Pending
Session：No Session »
No files
Abstract
Currently, the main technical routes for extreme ultraviolet (EUV) light sources used in lithography research include laser-produced plasma (LPP) light sources and discharge-produced plasma (DPP) light sources. Among DPPs, the inductive electrodeless Z-pinch light source developed by Energetiq is a preferred medium power EUV source technical route due to its electrodeless structural design, which avoids electrode ablation and extends the lifespan of optical components [1].
The fundamental principle of inductive electrodeless Z-pinch is to generate plasma by breaking down low-pressure fuel gas through an induced electric field. The plasma current then drives high repetition-frequency Z-pinch to produce medium power EUV radiation. Therefore, it is necessary to understand the discharge characteristics of inductive high repetition-rate Z-pinch, in order to better design the induction structure and operating conditions of the device based on the expected output parameters.
Based on the structure of the electrodeless Z-pinch EUV light source designed by Energetiq, an inductive repetitive Z-pinch discharge device was made. Different operating conditions were altered to study the discharge characteristics of inductive repetitive Z-pinch. The operating conditions studied included applied voltage, ambient pressure, frequency, and gas filling flow rate.
[1] Horne, S.F., Besen, M.M., Smith, D.K., Blackborow, P.A., and D'Agostino, R.: ‘Application of a high-brightness electrodeless Z-pinch EUV source for metrology, inspection, and resist development.’, Proc Spie, 2006, 6151
The fundamental principle of inductive electrodeless Z-pinch is to generate plasma by breaking down low-pressure fuel gas through an induced electric field. The plasma current then drives high repetition-frequency Z-pinch to produce medium power EUV radiation. Therefore, it is necessary to understand the discharge characteristics of inductive high repetition-rate Z-pinch, in order to better design the induction structure and operating conditions of the device based on the expected output parameters.
Based on the structure of the electrodeless Z-pinch EUV light source designed by Energetiq, an inductive repetitive Z-pinch discharge device was made. Different operating conditions were altered to study the discharge characteristics of inductive repetitive Z-pinch. The operating conditions studied included applied voltage, ambient pressure, frequency, and gas filling flow rate.
[1] Horne, S.F., Besen, M.M., Smith, D.K., Blackborow, P.A., and D'Agostino, R.: ‘Application of a high-brightness electrodeless Z-pinch EUV source for metrology, inspection, and resist development.’, Proc Spie, 2006, 6151
Keywords
EUV,electrodeless Z-pinch
Speaker
Hongyu Jia
在读博士生 清华大学Submission Author
All Comments
Important Date
-
May 12
2026
Conference Date
-
Apr 15 2026
Draft paper submission deadline
-
May 12 2026
Registration deadline
Sponsored By
National Key Laboratory of Plasma Physics, Laser Fusion Research Center, China Academy of Engineering Physics
Xiamen University
Xiamen University
Contact Information
Previous Conferences
-
2025-05-12 China 西安市
The 8th International Conference on Matter and Radiation at Extremes -
2024-05-13 China Hangzhou
7th International Conference on Matter and Radiation at Extremes -
2023-06-05 China Zhuhai
The 6th International Conference on Matter and Radiation at Extremes -
2020-05-25 China Xi'an
The 5th International Conference on Matter and Radiation at Extremes -
2019-05-29 China Hefei
The 4th International Conference on Matter and Radiation at Extremes -
2017-06-01 China Beijing,China
2nd International Conference on Matter and Radiation at Extremes
Submit Comment