227 / 2016-07-04 12:20:55
Mechanism Simulation of Integrated Circuit Interconnection Electromigration Failure
10779,10780,10781,10782
Draft Accepted
刘 娜 / 北京航空航天大学
The existing life prediction model does not reflect the degradation law of the electrical properties of the interconnect during electromigration process, so there are great limitations in its practical application. This research developed a new failure mechanism degradation model to describe the law of the interconnect performance degradation in the process of electromigration. This paper takes operational amplifier as an example to achieve the failure mechanism injection of the integrated circuit. Through the simulation, this paper shows how the response characteristics of all the measurable signal nodes of the integrated circuit changes with the occurrence and development of electromigration, and meanwhile provides technical support for circuit fault diagnosis and prediction.
Important Date
  • Conference Date

    Jul 09

    2016

    to

    Jul 10

    2016

  • Jul 06 2016

    Draft paper submission deadline

  • Jul 06 2016

    Final Paper Deadline

  • Jul 10 2016

    Registration deadline

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湖北众科地质和环境技术服务中心
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