475 / 2017-05-10 10:40:26
Vacuum arc behavior and its development process under micro-second scale
13823,13931,13932,13933
Final Paper
振国 李 / State Key Laboratory of Electrical Insulation and Power Equipment, Xi’an Jiaotong University, Xi’an, 710049, China
仁杰 林 / State Key Laboratory of Electrical Insulation and Power Equipment, Xi’an Jiaotong University, Xi’an, 710049, China
申立 贾 / State Key Laboratory of Electrical Insulation and Power Equipment, Xi’an Jiaotong University, Xi’an, 710049, China
立军 王 / State Key Laboratory of Electrical Insulation and Power Equipment, Xi’an Jiaotong University, Xi’an, 710049, China
A lot of work had been made in the vacuum arc in power frequency. But there are few research reports about high-frequency vacuum arc. In this paper, the arc appearance and development process have been studied under 250 kHz. A compact resistance-inductance-capacitance (RLC) series resonant circuit was designed to generate high-frequency vacuum arc between plate electrodes in a detachable vacuum chamber. High voltage probe and current transformer were used to measure arc voltage and arc current. Intensified charge-coupled device (ICCD) were adopted to observe the arc behavior under the different frequency. Just like the arc development in commercial frequency, at the beginning, the arc is ignited at the triggered point and then the arc became brighter and its diameter also increased. As time went by, the arc is diffusing in the whole gap but the arc is not extinct completely when the discharge current cross zero. At the same gap distance, the arc burns more fiercely as the charge voltage rises. With the gap distance increases, the diffusion between vacuum gap become more intense but the discharge current remains unchanged.
Important Date
  • Conference Date

    Oct 22

    2017

    to

    Oct 25

    2017

  • Jan 04 2017

    Abstract Notification of Acceptance

  • Mar 10 2017

    Draft Paper Acceptance Notification

  • Jun 30 2017

    Final Paper Deadline

  • Oct 25 2017

    Registration deadline

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