Introduction
It is our great pleasure to announce that the 14th International Conference on Plasma Based Ion Implantation & Deposition, PBII&D 2017 will be held at the Changning Campus of Shanghai Institute of Ceramics, Chinese Academy of Sciences (SIC CAS), Shanghai, China, during October 17-20, 2017.
Organised every two years, the PBII&D conference is the occasion to present latest scientific developments and detect future trends concerning plasma based ion assisted surface treatments and thin films deposition. This conference is designed to bring you a fruitful gathering, allowing the contact with key researchers from all regions of the world, opening up opportunities for new collaborations at global level.
Call for paper
Important date
Submission Topics
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Plasma Based Ion Implantation and Deposition
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IBAD; Vacuum Arc & Hybrid Processes
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Pulsed Power Deposition (HIPIMS)
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Plasma/Ion Sources; Pulsed Power and PBII Systems
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Plasma Diagnotics/Modeling
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Plasma/Ion-Surface Interaction
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Functional Materials and Interfaces (Biomaterials, DLC, Nanostructures, Semiconductors, etc.)
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Industrial Applications, Scaling Issues
All Comments
Important Date
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Conference Date
Oct 17
2017
toOct 20
2017
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Jul 10 2017
Abstract Submission Deadline
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Oct 20 2017
Registration deadline
Sponsored By
Contact Information
- Huiliang Cao
- pb******@mail.sic.ac.cn
- 86-*********
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