372 / 2018-03-29 22:55:34
Reliability investigation of AlGaN/GaN HEMTs under reverse-bias stress at 77K
low temperature; trap; reverse-bias step stress; ALGaN/GaN; HEMT; reliability
Abstract Pending
Qing Zhu / Xidian University
The degradation phenomenon and mechanism of AlGaN/GaN HEMTs working at cryogenic temperature have been rarely reported. In this paper, degradation of AlGaN/GaN HEMTs under reverse-bias step stress at 300K and 77K was investigated. The electrons tunneling from gate electrode trapped at the SiN/AlGaN interface and in the AlGaN barrier were more difficult to escape at 77K compared with 300K. The trapping and detrapping behavior had a more serious affect on the properties of devices after reverse bias stress at low temperature than at room temperature. The trapped electrons reduced the electric field peak on the gate edge and few thermal phonons existed at the lower temperature resulting in the higher “critical voltage” for inverse piezoelectric effect at 77K.
Important Date
  • Conference Date

    May 17

    2018

    to

    May 19

    2018

  • Dec 08 2017

    Abstract Submission Deadline

  • Jan 30 2018

    Abstract Notification of Acceptance

  • Feb 10 2018

    Draft paper submission deadline

  • Feb 10 2018

    Final Paper Deadline

  • May 19 2018

    Registration deadline

Sponsored By
IEEE
Organized By
Xi'an Jiaotong University
Xidian University
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