Introduction
After the successful conferences in Nara, Japan (2012), Flagstaff, USA (2014) and Montpellier, France (2016), the 20th International Conference on Molecular Beam Epitaxy will take place in Shanghai, China.
The International Conference on Molecular Beam Epitaxy (ICMBE 2018) provides a prominent international forum for reporting new developments in the areas of fundamental and applied molecular beam epitaxy research, including advances in the technique, synthesis of new materials, discovery of new physical properties, formation of novel heterostructures, and the development of innovative devices.
Committee
Qian Gong Shanghai Institute of Microsystem and Information Technology, CAS, China
Yi Gu Shanghai Institute of Microsystem and Information Technology, CAS, China
Yi Huang Shanghai Institute of Microsystem and Information Technology, CAS, China
Xingyou Chen Shanghai Institute of Microsystem and Information Technology, CAS, China
Yingjie Ma Shanghai Institute of Microsystem and Information Technology, CAS, China
Chunfang Cao Shanghai Institute of Microsystem and Information Technology, CAS, China
Guixiang He Shanghai Institute of Microsystem and Information Technology, CAS, China
Jiannan Cao Shanghai Institute of Microsystem and Information Technology, CAS, China
Call for paper
All Comments
Important Date
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Conference Date
Sep 02
2018
toSep 07
2018
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Sep 07 2018
Registration deadline
Contact Information
- Prof. Qian Gong
- mb******@mail.sim.ac.cn
- +86*********
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