Advances in Metrology for X-Ray and EUV Optics V

This conference will address the broad issues in the growing and very demanding field of surface metrology and characterization of optics for EUV/X-Ray synchrotron and FEL radiation and for other EUV/X-Ray applications such as astronomical imaging, solar physics, and lithography. Improving the performance of existing instrumentation and techniques, as well as developing new and novel ones, is critical for the fabrication of high-quality optics to meet current and future requirements for these applications.