Advances in X-Ray/EUV Optics and Components IX

Expanding use of x-ray and EUV radiation in many scientific and technical applications requires the continued development of new and improved sources and optics to deliver brighter, better-conditioned beams to the end-user. This conference focuses on the advances, as well as the emerging needs, in x-ray and EUV sources, optics, and applications including next-generation synchrotron sources, EUV photolithography, laboratory sources, and x-ray astronomy. In radiation to sources and source/optics integration, the topics covered include design, development, fabrication, installation, evaluation, and applications of optical elements such as mirrors, monochromators, multilayers, zone-plates, and lenses. It is also an aim of this conference to provide an opportunity for the developers and users to share both the progress and challenges in each of these and related areas.