Introduction
The Symposium, hosted by SEMATECH in cooperation with EIDEC and imec, provides a forum to discuss and assess the worldwide status of EUVL technology and infrastructure readiness.
Call for paper
Submission Topics
Presentations for this symposium are being solicited for the following EUVL topics, with a strong preference for contributions discussing HVM introduction and EUVL extendibility.
· Exposure tools (ET)
· Source-collector module (SO)
· Masks (MA)
· Resists and materials (RE)
· Resist outgassing and contamination (OC)
· Metrology and inspection (MI)
· Processes enhancing EUV (PE)
All Comments
Important Date
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Conference Date
Oct 27
2014
toOct 29
2014
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Oct 29 2014
Registration deadline
Sponsored By
The Optical Society
Contact Information
- Marcy DeBiccari
- eu******@sematech.org
- -**********
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