Introduction
SPIE Advanced Lithography, the premier conference for the lithography community. For 40 years, SPIE has brought together industry leaders to solve the latest challenges in lithography and patterning in the semiconductor industry.
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Submission Topics
1: Layout Optimization and Design Restrictions
2: Layout Analytics
3: Design and Litho Optimization: Joint Session with Conferences 9780 and 9781
4: Circuit Modeling
Interactive Poster Session
5: Hotspot Detection and Removal
6: Multiple Patterning and Directed Self-Assembly
7: Design Interaction with Metrology: Joint Session with Conferences 9778 and 9781
8: Process and Yield Modeling
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Important Date
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Conference Date
Feb 24
2016
toFeb 25
2016
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Feb 25 2016
Registration deadline
Contact Information
- cu******@spie.org
- +1-*********
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