Introduction
SPIE Advanced Lithography, the premier conference for the lithography community. For 40 years, SPIE has brought together industry leaders to solve the latest challenges in lithography and patterning in the semiconductor industry.
Call for paper
Submission Topics
1: Overviews of Nanopatterning Challenges
2: New Plasma Sources and New Etching Technologies
3: Nanopatterning for Advanced Logic and Memory Technology Nodes
4: Patterning Integration Schemes (multilayer, patterning, self-aligned patterning, etc.)
5: Patterning Materials and Etch: Joint Session with Conferences 9779 and 9782
6: Emerging Patterning Technologies (DSA, and other) Interactive Poster Session
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Important Date
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Conference Date
Feb 22
2016
toFeb 23
2016
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Feb 23 2016
Registration deadline
Contact Information
- cu******@spie.org
- +13*********
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