Introduction

Low power CMOS and embedded memory Foundry technology RF process, device and integration technology Standalone memory: DRAM, FLASH, emerging memory technology Advanced process modules: e.g. gate stack, junction, strain/channel engineering, low-R contact, low-C spacer/ILD, interconnect technology, ALE and selective deposition, etc. Nanopatterning: Multiple patterning, Directed Self-Assembly, EUV, etc. Power and analog IC device and technology Advanced CMOS process and devices: Ge, SiGe, III-V, FinFET, GAA, 2D materials/1D nanowires Material, Process and device modeling TFT and organic electronics MEMS, imagers and sensors Advanced manufacturing technology, metrology and yield Reliability physics, characterization and test Advanced packaging and 2.5D/3D Integration Photonics and Beyond CMOS Technology Energy harvesting technology Wearable and loE enabling technologies Neuromo

Call for paper

Important date

2017-10-31
Abstract submission deadline
2017-10-31
Draft paper submission deadline
2017-12-31
Draft paper acceptance notification
2017-10-31
Final paper submission deadline
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Important Date
  • Conference Date

    Apr 16

    2018

    to

    Apr 19

    2018

  • Oct 31 2017

    Abstract Submission Deadline

  • Oct 31 2017

    Draft paper submission deadline

  • Oct 31 2017

    Final Paper Deadline

  • Dec 31 2017

    Draft Paper Acceptance Notification

  • Apr 19 2018

    Registration deadline

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Organized By
Industrial Technology Research Institute - ITRI
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