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Introduction
The 13th International Workshop on Junction Technology (IWJT2013) will be held on June 6 - 7, 2013 in Kyoto, Japan. The IWJT, started in 2000 and was held annually in Japan or China, is an open forum focused on the needs and interests of the community on a junction formation technology in semiconductors. At the past IWJTs, a number of eminent and experienced scientists and engineers from Asia, America and Europe presented their latest results on junction technology. The workshop will provide a good opportunity for researchers and engineers to present their new research results, and exchange ideas with leading scientists.
Call for paper

Submission Topics

Papers are solicited in, but not limited to the following Doping Technology --- Ion implantation, plasma doping, gas and solid doping Annealing Technology --- Rapid thermal process, laser annealing, flash annealing, SPE, new activation annealing, lattice
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Important Date
  • Conference Date

    Jun 06

    2013

    to

    Jun 07

    2013

  • Jun 07 2013

    Registration deadline

Sponsored By
IEEE Electron Devices Society - ED Japan Council ED Chapter Kansai Section ED Chapter
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