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Introduction
The 14th International Workshop on Junction Technology (IWJT2014) will be held on May 18 - 20, 2014 in Shanghai, China. The IWJT, started in 2000 and was held annually in Japan or China, is an open forum focused on the needs and interest of the community of a junction formation technology in semiconductors. At the past IWJTs, a number of eminent and experienced scientists and engineers from Asia, America, and Europe presented their latest results on junction technology. The workshop will provide a good opportunity for researchers and engineers to present their new research results, and exchange ideas with leading scientists in this field.
Call for paper

Important date

2014-03-03
Abstract submission deadline

Submission Topics

Workshop Scope (Papers are solicited in, but not limited to the following) Doping Technology --- Ion implantation, plasma doping, gas and solid doping Annealing Technology --- Rapid thermal process, laser annealing, flash annealing, SPE, lattice damage
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Important Date
  • Conference Date

    May 18

    2014

    to

    May 20

    2014

  • Mar 03 2014

    Abstract Submission Deadline

  • May 20 2014

    Registration deadline

Sponsored By
复旦大学
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